Simulation of Engineered Nanostructured Thin Films

Abstract

The invention of the Glancing Angle Deposition (GLAD) technique a decade ago enabled the fabrication of nanostructured thin films with highly tailorable structural, electrical, optical, and magnetic properties. Here a three-dimensional atomic-scale growth simulator has been developed to model the growth of thin film materials fabricated with the GLAD technique, utilizing the Monte Carlo (MC) and Kinetic Monte Carlo (KMC) methods; the simulator is capable of predicting film structure under a wide range of deposition conditions with a high degree of accuracy as compared to experiment. The stochastic evaporation and transport of atoms from the vapor source to the substrate is modeled as random ballistic deposition, incorporating the dynamic variation in substrate orientation that is central to the GLAD technique, and surface adatom diffusion is modeled as either an activated random walk (MC), or as energy dependent complete system transitions with rates calculated based on site-specific bond counting (KMC). The Sculptured Nanostructured Film Simulator (SNS) provides a three-dimensional physical prediction of film structure given a set of deposition conditions, enabling the calculation of film properties including porosity, roughness, and fractal dimension. Simulations were performed under various growth conditions in order to gain an understanding of the effects of incident angle, substrate rotation, tilt angle, and temperature on the resulting morphology of the thin film. Analysis of the evolution of film porosity during growth suggests a complex growth dynamic with significant variations with changes in tilt or substrate motion, in good agreement with x-ray reflectivity measurements. Future development will merge the physical structure growth simulator, SNS, with Finite-Difference Time-Domain (FDTD) electromagnetics simulation to allow predictive design of nanostructured optical materials.